ASML
Senior Mechatronics Engineer — Reticle Stage, Design & Engineering
Four years on the reticle stage of EUV lithography systems: maintaining and improving the control architecture of the motion stage, and qualifying design changes on test rigs before they reached the field.
- Owned changes end to end — identifying the issue or improvement, turning it into requirements and design decisions, then dividing scope with electrical, software and mechanical development and seeing it through to delivery.
- Ran lithography test rigs to test and qualify design changes against real hardware before release.
- Developed and standardised test strategies for motion control systems in MATLAB, Simulink and Python, and established DFMEA practice across teams.
- Led field escalations and troubleshooting on production systems, and built data-driven diagnostics that caught failures before they became downtime.
- Acted as team lead — mentoring engineers and owning technical execution across concurrent projects.